FORMATION METHOD OF FINE PATTERNS AND MANUFAUCTURATION METHOD OF SEMICONDUCTOR LIGHT EMITTING DEVICE

A formation method of fine patterns and a manufacturing method of a semiconductor light emitting device are provided to minimize the damage region due to the dry etch by forming a structure through the wet etching of the horizontal direction. A mask(18) having a predetermined pattern is formed on a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE, GWAN SU, LEE, JONG HO, KIM, JIN HA, PARK, MOO YOUN, HWANG, SOO RYONG, JUNG, IL HYUNG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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