POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

A positive resist composition containing resin component (A) and acid generator component (B), characterized in that the component (A) contains structural unit (a1) derived from hydroxystyrene and structural unit (a2) having an acetal based acid dissociative dissolution inhibiting group while the co...

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Bibliographische Detailangaben
Hauptverfasser:	TAKASU RYOICHI, MIMURA TAKEYOSHI, KAWAUE AKIYA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	A positive resist composition containing resin component (A) and acid generator component (B), characterized in that the component (A) contains structural unit (a1) derived from hydroxystyrene and structural unit (a2) having an acetal based acid dissociative dissolution inhibiting group while the component (B) contains acid generator (B1-i) having at least one anion moiety selected from the group represented by the general formulae (b-3), (b-4) and (b-5), or acid generator (B1-ii) having an anion moiety represented by the general formula (b-6), or acid generator (B1-iii) having a cation moiety represented by the general formula (b'-3). (b-3), (b-4), (b-5) (b-6) (b'-3).