LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD

A lithographic apparatus and a contamination removal or prevention method are provided to remove or prevent contamination at the lithography apparatus. An immersion type lithography apparatus comprises: an immersion system to charge the immersion space with immersion liquid partly or whole; a washin...

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Hauptverfasser:	WANTEN PETER FRANCISCUS, JANSEN HANS, DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS, VAN DER NET ANTONIUS JOHANNUS, VAN DER DONCK JACQUES COR JOHAN, VAN DEN DOOL TEUNIS CORNELIS, CROMWIJK JAN WILLEM, LEENDERS MARTINUS HENDRIKUS ANTONIUS, SCHUH NADJA, WATSO ROBERT DOUGLAS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic apparatus and a contamination removal or prevention method are provided to remove or prevent contamination at the lithography apparatus. An immersion type lithography apparatus comprises: an immersion system to charge the immersion space with immersion liquid partly or whole; a washing liquid supply system to provide the washing liquid for the immersion space; and a washing liquid included in the washing liquid supply system and/or the immersion space. The washing liquid is made of elementarily hyperpure water and mixture of basically hydrogen peroxide and ozone, hydrogen peroxide of 10% concentration, ozone of 50 ppm concentration or oxygen of 10 ppm concentration.