COATING APPARATUS AND COATING METHOD

A coating apparatus and coating method is provided to realize shortening of the processing tact by performing coating continuously without a time interval and ejecting a liquid solution on the second substrate. In a coating apparatus and coating method, a substrate transferring unit lifts the substr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MASU YOSHIAKI, SHIMIZU AKIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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