COATING APPARATUS AND COATING METHOD

A coating apparatus and coating method is provided to realize shortening of the processing tact by performing coating continuously without a time interval and ejecting a liquid solution on the second substrate. In a coating apparatus and coating method, a substrate transferring unit lifts the substr...

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Bibliographische Detailangaben
Hauptverfasser:	MASU YOSHIAKI, SHIMIZU AKIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A coating apparatus and coating method is provided to realize shortening of the processing tact by performing coating continuously without a time interval and ejecting a liquid solution on the second substrate. In a coating apparatus and coating method, a substrate transferring unit lifts the substrate and send it, at that time ejects a liquid solution on the substrate through a nozzle on the coating apparatus. A coating unit has a plurality of respective pump, sending the liquid solution out, to the each nozzle which is arrange in direction of transferring the substrate and has the same length of path to the nozzle. A support frame is installed so that the pump ascended and descended the nozzle.