ROTATABLE CONTAMINATION BARRIER AND LITHOGRAPHIC APPARATUS COMPRISING SAME

A rotatable contamination barrier (1) for use with an EUV radiation system is disclosed. The contamination barrier (1) has a blade structure (2) configured to trap contaminant material coming from a radiation source (6), a bearing structure, coupled to a static frame, configured to rotatably bear th...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: VAN DEN WILDENBERG LAMBERTUS ADRIANUS
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A rotatable contamination barrier (1) for use with an EUV radiation system is disclosed. The contamination barrier (1) has a blade structure (2) configured to trap contaminant material coming from a radiation source (6), a bearing structure, coupled to a static frame, configured to rotatably bear the blade structure (2), and an eccentric mass element (12) displaced relative to a central axis of rotation (13) to balance the blade structure (12) in the bearing structure.