LITHOGRAPHIC APPATRATUS AND DEVICE MANUFACTURED THEREBY

A lithographic method and a device manufactured thereby are provided to reduce processing steps and costs and to increase a throughput by performing a simultaneous edge bead removal process to remove both edge beads of a top-coating layer and a resist layer. A part of an anti-reflective coating adja...

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Bibliographische Detailangaben
Hauptverfasser:	WONG PATRICK, GEHOEL VAN ANSEM WENDY FRANSISCA JOHANNA, MAAS RUDOLF ADRIANUS JOANNES, WANG SUPING
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic method and a device manufactured thereby are provided to reduce processing steps and costs and to increase a throughput by performing a simultaneous edge bead removal process to remove both edge beads of a top-coating layer and a resist layer. A part of an anti-reflective coating adjacent to a peripheral part of a substrate is removed from the substrate provided with the anti-reflective coating to be extended to or beyond a peripheral edge of the substrate by using a back-side removal process. A layer of radiation sensitive material is deposited on the anti-reflective coating. A top-coating layer is deposited on the layer of radiation sensitive material. A part of the layer of radiation sensitive material and a part of the top-coating layer are simultaneously removed from a periphery of an area adjacent to the peripheral part of the substrate by using a top-side removal process. A process for removing a part of the anti-reflective coating includes a process for removing an edge bead of the anti-reflective coating.