WATER-BASED STRIPPING COMPOSITION FOR REMOVING POLYMERS AND METHOD OF STRIPPING PHOTORESIST USING THE SAME

An aqueous stripper composition for removing a polymer, and a stripping method for removing a polymer after wet etching, dry etching or high temperature ashing by using the composition are provided to remove a polymer effectively without the corrosion of a film at a low temperature within a short processing time. An aqueous stripper composition for removing a polymer comprises 0.1-20 wt% of sulfuric acid; 0.01-10 wt% of a fluorine compound; 0.1-10 wt% of a sulfur-containing anticorrosive having a sulfate or a mercapto group; 0.0001-1 wt% of a surfactant; and 60-99 wt% of deionized water. Preferably the fluorine compound is hydrofluoric acid, ammonium fluoride, ammonium hydrofluoride, ammonium borofluoride, fluoboric acid, hydrogen fluoride or their mixture.