ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING

A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1)...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KANG, MIN HO, CHOI, HYUN, YANG, SEUNG HO, HONG, GIL SU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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