ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING

A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1)...

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Bibliographische Detailangaben
Hauptverfasser: KANG, MIN HO, CHOI, HYUN, YANG, SEUNG HO, HONG, GIL SU
Format: Patent
Sprache:eng
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Zusammenfassung:A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1). The carbon sheet is mounted to the mold for the electric discharge plasma sintering filling the powder(S2). A mold set is prepared by filling the power in the mold in which the carbon sheet is mounted, and sets the powder at a chamber of a spark plasma sintering system. The pressure of the chamber is reduced by an atmosphere control system. The pressure and current is given to the chamber for increasing the temperature(S4). The chamber where temperature increases is pressurized to the final sintering temperature with 10-15 mins and performs furnace cooling(S5). The carbon sheet adhering to the cooled sintered body is removed(S6).