ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING

A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1)...

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Hauptverfasser: KANG, MIN HO, CHOI, HYUN, YANG, SEUNG HO, HONG, GIL SU
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creator KANG, MIN HO
CHOI, HYUN
YANG, SEUNG HO
HONG, GIL SU
description A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1). The carbon sheet is mounted to the mold for the electric discharge plasma sintering filling the powder(S2). A mold set is prepared by filling the power in the mold in which the carbon sheet is mounted, and sets the powder at a chamber of a spark plasma sintering system. The pressure of the chamber is reduced by an atmosphere control system. The pressure and current is given to the chamber for increasing the temperature(S4). The chamber where temperature increases is pressurized to the final sintering temperature with 10-15 mins and performs furnace cooling(S5). The carbon sheet adhering to the cooled sintered body is removed(S6).
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING
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