ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING
A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1)...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | KANG, MIN HO CHOI, HYUN YANG, SEUNG HO HONG, GIL SU |
description | A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1). The carbon sheet is mounted to the mold for the electric discharge plasma sintering filling the powder(S2). A mold set is prepared by filling the power in the mold in which the carbon sheet is mounted, and sets the powder at a chamber of a spark plasma sintering system. The pressure of the chamber is reduced by an atmosphere control system. The pressure and current is given to the chamber for increasing the temperature(S4). The chamber where temperature increases is pressurized to the final sintering temperature with 10-15 mins and performs furnace cooling(S5). The carbon sheet adhering to the cooled sintered body is removed(S6). |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20080102786A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20080102786A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20080102786A3</originalsourceid><addsrcrecordid>eNrjZAiJ8vRzVvCP8HRx1XVyDHZ1UQgOCA0JcQ3y9HNXCHEMcncNUfB19At1c3QOCQUL-rqGePi7KIQGgzjBAY5B3goBPo7Bvo4KQBGIRh4G1rTEnOJUXijNzaDs5hri7KGbWpAfn1pckJicmpdaEu8dZGRgYGFgaGBkbmHmaEycKgAclzFd</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING</title><source>esp@cenet</source><creator>KANG, MIN HO ; CHOI, HYUN ; YANG, SEUNG HO ; HONG, GIL SU</creator><creatorcontrib>KANG, MIN HO ; CHOI, HYUN ; YANG, SEUNG HO ; HONG, GIL SU</creatorcontrib><description>A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1). The carbon sheet is mounted to the mold for the electric discharge plasma sintering filling the powder(S2). A mold set is prepared by filling the power in the mold in which the carbon sheet is mounted, and sets the powder at a chamber of a spark plasma sintering system. The pressure of the chamber is reduced by an atmosphere control system. The pressure and current is given to the chamber for increasing the temperature(S4). The chamber where temperature increases is pressurized to the final sintering temperature with 10-15 mins and performs furnace cooling(S5). The carbon sheet adhering to the cooled sintered body is removed(S6).</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081126&DB=EPODOC&CC=KR&NR=20080102786A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081126&DB=EPODOC&CC=KR&NR=20080102786A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KANG, MIN HO</creatorcontrib><creatorcontrib>CHOI, HYUN</creatorcontrib><creatorcontrib>YANG, SEUNG HO</creatorcontrib><creatorcontrib>HONG, GIL SU</creatorcontrib><title>ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING</title><description>A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1). The carbon sheet is mounted to the mold for the electric discharge plasma sintering filling the powder(S2). A mold set is prepared by filling the power in the mold in which the carbon sheet is mounted, and sets the powder at a chamber of a spark plasma sintering system. The pressure of the chamber is reduced by an atmosphere control system. The pressure and current is given to the chamber for increasing the temperature(S4). The chamber where temperature increases is pressurized to the final sintering temperature with 10-15 mins and performs furnace cooling(S5). The carbon sheet adhering to the cooled sintered body is removed(S6).</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAiJ8vRzVvCP8HRx1XVyDHZ1UQgOCA0JcQ3y9HNXCHEMcncNUfB19At1c3QOCQUL-rqGePi7KIQGgzjBAY5B3goBPo7Bvo4KQBGIRh4G1rTEnOJUXijNzaDs5hri7KGbWpAfn1pckJicmpdaEu8dZGRgYGFgaGBkbmHmaEycKgAclzFd</recordid><startdate>20081126</startdate><enddate>20081126</enddate><creator>KANG, MIN HO</creator><creator>CHOI, HYUN</creator><creator>YANG, SEUNG HO</creator><creator>HONG, GIL SU</creator><scope>EVB</scope></search><sort><creationdate>20081126</creationdate><title>ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING</title><author>KANG, MIN HO ; CHOI, HYUN ; YANG, SEUNG HO ; HONG, GIL SU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20080102786A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>KANG, MIN HO</creatorcontrib><creatorcontrib>CHOI, HYUN</creatorcontrib><creatorcontrib>YANG, SEUNG HO</creatorcontrib><creatorcontrib>HONG, GIL SU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KANG, MIN HO</au><au>CHOI, HYUN</au><au>YANG, SEUNG HO</au><au>HONG, GIL SU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING</title><date>2008-11-26</date><risdate>2008</risdate><abstract>A zinc oxide-based sputtering target manufacturing method using spark plasma sintering having high intensity is provided to achieve high intensity and excellent property by mixing and drying the zinc oxide powder and using the spark plasma sintering. The zinc oxide powder is pulverized and dried(S1). The carbon sheet is mounted to the mold for the electric discharge plasma sintering filling the powder(S2). A mold set is prepared by filling the power in the mold in which the carbon sheet is mounted, and sets the powder at a chamber of a spark plasma sintering system. The pressure of the chamber is reduced by an atmosphere control system. The pressure and current is given to the chamber for increasing the temperature(S4). The chamber where temperature increases is pressurized to the final sintering temperature with 10-15 mins and performs furnace cooling(S5). The carbon sheet adhering to the cooled sintered body is removed(S6).</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_KR20080102786A |
source | esp@cenet |
subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | ZINC OXIDE-BASED SPUTTERING TARGET MANUFACTURING METHOD USING SPARK PLASMA SINTERING |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-07T14%3A30%3A32IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KANG,%20MIN%20HO&rft.date=2008-11-26&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20080102786A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |