DISPLACEMENT MEASUREMENT SYSTEMS LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A displacement measurement system, a lithographic apparatus and a device manufacturing method are provided to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space. A displacement measurement syste...

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Bibliographische Detailangaben
Hauptverfasser:	LOOPSTRA ERIK ROELOF, VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS, KLAVER RENATUS GERARDUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A displacement measurement system, a lithographic apparatus and a device manufacturing method are provided to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space. A displacement measurement system comprises first and second elongated diffraction gratings(211,214) and a sensor(216). The elongated side of the first elongated diffraction grating is aligned in parallel to a first direction and the elongated side of the second elongated diffraction grating is aligned in parallel to a second direction which is not parallel to the first direction. The sensor detects a pattern of radiation generated by the diffraction of at least one beam of radiation by the first and second elongated diffraction gratings. The pattern of radiation indicates the displacement of the first elongated diffraction grating with respect to the second elongated diffraction grating in a third direction perpendicular to both the first and the second direction.