MANUFACTURING METHOD OF ELECTRODE BASE BODY HAVING AN AUXILIARY WIRING

MANUFACTURING METHOD OF ELECTRODE BASE BODY HAVING AN AUXILIARY WIRING

A manufacturing method of an electrode base body having an auxiliary wiring is provided to suppress corrosion of the auxiliary wiring against an etchant for a transparent conductive layer, thereby efficiently performing patterning of the transparent conductive layer and laminations for forming the a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: HIRUMA TAKEHIKO
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:A manufacturing method of an electrode base body having an auxiliary wiring is provided to suppress corrosion of the auxiliary wiring against an etchant for a transparent conductive layer, thereby efficiently performing patterning of the transparent conductive layer and laminations for forming the auxiliary wiring. An electrode base body having an auxiliary wiring has a transparent electrode(3) on a glass substrate(1) and has the auxiliary wiring(2) including an under layer(2a), a conductor layer(2b) and a cap layer(2c) patterned on the transparent electrode. An organic layer(4) having a hole transport layer, an electroluminescent layer and an electron transport layer is formed on the transparent electrode after forming the base body having the auxiliary wiring. An AI cathode(5) as a cathode back electrode is formed by vacuum deposition so as to be orthogonal to the transparent conductive layer after forming the auxiliary wiring, the transparent electrode and the organic layer. Exposure of a width direction of the auxiliary wiring which is not coated by photoresist is 4‘í or less. An etchant used in etching of the transparent conductive layer is a non-oxidizing acid.