GAS SUPPLY UNIT

GAS SUPPLY UNIT

A gas supply unit is provided to adjust an opening degree of a third fluid control valve based on a pressure difference between secondary pressure of a first fluid control valve and secondary pressure of a second fluid control valve. A gas supply unit comprises a mass flow controller(14), a first fl...

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Bibliographische Detailangaben
Hauptverfasser: NISHIMURA YASUNORI, ISHIZUKA HOTAKA, SUGIMOTO YOSHIO, ITOH KAZUTOSHI, SUGINO AKIHITO, TOMITA HIROSHI, FUKUHARA JOTA
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A gas supply unit is provided to adjust an opening degree of a third fluid control valve based on a pressure difference between secondary pressure of a first fluid control valve and secondary pressure of a second fluid control valve. A gas supply unit comprises a mass flow controller(14), a first fluid control valve(15), a second fluid control valve(17), and a third fluid control valve(19). The first fluid control valve is connected to the mass flow controller. The second fluid control valve is connected to the mass flow controller and arranged in parallel to the first fluid control valve. The third fluid control valve is placed on a secondary side of the second fluid control valve. An opening degree of the third fluid control valve is adjustable based on a pressure difference between secondary pressure of the first fluid control valve and secondary pressure of the second fluid control valve.