MULTI-LAYER TEMPERATURE CONTROL APPARATUS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT AND METHOD OF THE SAME

A method and an apparatus for adjusting a temperature of semiconductor manufacturing equipment are provided to reliably control a temperature on an overall surface of a wafer by adopting a MIMO(Multiple Input Multiple Output) control scheme. An apparatus for adjusting a temperature of semiconductor...

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1. Verfasser: LEE, NAE IL
Format: Patent
Sprache:eng
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