MULTI-LAYER TEMPERATURE CONTROL APPARATUS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT AND METHOD OF THE SAME

A method and an apparatus for adjusting a temperature of semiconductor manufacturing equipment are provided to reliably control a temperature on an overall surface of a wafer by adopting a MIMO(Multiple Input Multiple Output) control scheme. An apparatus for adjusting a temperature of semiconductor manufacturing equipment includes a plate(102), plural heaters(120,122,124), plural sensors(130,132,134), and a controller(104). A substrate is mounted on the plate. The heaters are arranged on plural regions on the plate and heat the plate to adjust a temperature of the substrate. The sensors detect temperatures on the regions of the plate. The controller receives temperature information on the regions of the plate from the sensor and controls the heaters to be proper for semiconductor manufacturing equipment, and uniformly adjusts a temperature of the substrate by controlling the heaters.