PHOTOELECTRIC CONVERSION DEVICE AND METHOD OF MANUFACTURING THE SAME
A photoelectric conversion device and a method for manufacturing the same are provided to reduce lowering of incident light by a simple process also in the case where an anti-diffusion layer is provided. A photoelectric conversion device includes a photoelectric conversion element and a multi-layere...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A photoelectric conversion device and a method for manufacturing the same are provided to reduce lowering of incident light by a simple process also in the case where an anti-diffusion layer is provided. A photoelectric conversion device includes a photoelectric conversion element and a multi-layered wiring structure. The photoelectric conversion element is disposed on a semiconductor substrate(111). The multi-layered wiring structure has a plurality of wiring layers(114,117) disposed to sandwich and an interlayer insulation layer therebetween over the semiconductor substrate. An anti-diffusion layer(115) is disposed on an uppermost wire layer among the wire layers to suppress a diffusion of a material forming the uppermost wire layer. The anti-diffusion layer covers regions of the uppermost wire layer and the interlayer insulation layer corresponding to the photoelectric conversion element. A lens(119) is disposed at a region corresponding to the photoelectric conversion element to be formed from a part of the anti-diffusion layer disposed on the uppermost wire layer or be disposed directly contacting with the anti-diffusion layer. |
---|