METHOD FOR CLEANING A SUBSTRATE AND APPARATUS FOR CLEANING A SUBSTRATE
A substrate cleaning method and a substrate cleaning apparatus are provided to secondly and uniformly clean an entire surface of a substrate after firstly cleaning edges of both sides of the substrate using cleaning solution. A substrate cleaning apparatus includes a substrate conveyer(150), a first...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A substrate cleaning method and a substrate cleaning apparatus are provided to secondly and uniformly clean an entire surface of a substrate after firstly cleaning edges of both sides of the substrate using cleaning solution. A substrate cleaning apparatus includes a substrate conveyer(150), a first brushing unit(200), and a second brushing unit(300). The substrate conveyer has conveying rollers(154) conveying a substrate(10). The first brushing units are disposed in an upper portion and a lower portion of the substrate, respectively, and clean edges of the substrate. The second brushing units are disposed in an upper portion and a lower portion of the substrate, respectively, and clean a front surface of the substrate. The first brushing units include a first shaft and two brushes provided in the first shaft to be spaced apart from each other, and clean the edges of the substrate. |
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