METHOD FOR CLEANING A SUBSTRATE AND APPARATUS FOR CLEANING A SUBSTRATE

A substrate cleaning method and a substrate cleaning apparatus are provided to secondly and uniformly clean an entire surface of a substrate after firstly cleaning edges of both sides of the substrate using cleaning solution. A substrate cleaning apparatus includes a substrate conveyer(150), a first...

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Bibliographische Detailangaben
Hauptverfasser: KANG, SANG WOOK, HEO, SANG HUN
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A substrate cleaning method and a substrate cleaning apparatus are provided to secondly and uniformly clean an entire surface of a substrate after firstly cleaning edges of both sides of the substrate using cleaning solution. A substrate cleaning apparatus includes a substrate conveyer(150), a first brushing unit(200), and a second brushing unit(300). The substrate conveyer has conveying rollers(154) conveying a substrate(10). The first brushing units are disposed in an upper portion and a lower portion of the substrate, respectively, and clean edges of the substrate. The second brushing units are disposed in an upper portion and a lower portion of the substrate, respectively, and clean a front surface of the substrate. The first brushing units include a first shaft and two brushes provided in the first shaft to be spaced apart from each other, and clean the edges of the substrate.