LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic apparatus and a device manufacturing method are provided to improve robustness of iterative learning control systems on set point variations. A lithographic apparatus includes a processing device which determines a feed forward transfer function of a control system. The processing dev...

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Bibliographische Detailangaben
Hauptverfasser:	HOUBEN DENNIS ANDREAS PETRUS HUBERTINA, VAN DE MOLENGRAFT MARINUS JACOBUS GERARDUS, BAGGEN CONSTANT PAUL MARIE JOZEF, BAGGEN MARK CONSTANT JOHANNES, VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA, TSO YIN TIM, HEERTJES MARCEL FRANCOIS, KAMIDI RAMIDIN IZAIR
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic apparatus and a device manufacturing method are provided to improve robustness of iterative learning control systems on set point variations. A lithographic apparatus includes a processing device which determines a feed forward transfer function of a control system. The processing device, which learns repeatedly an output signal(fff) of the control system using iterative learning control on a predetermined set point signal(r) and determines a relation between the learned feed forward output signal and the predetermined set point signal, includes program instructions for applying the relation as the feed forward transfer function of the control system.