SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus is provided to enhance sufficiently throughput in a substrate process by performing developing of substrates using plural developing units. A substrate processing apparatus includes a process unit for processing substrates, an ingoing/outgoing unit(9) for ingoing and outgoing the substrates, and a transferring unit(16) for transferring the substrates between the processing unit and the ingoing/outgoing unit. The process unit includes first and second processing units(11,13). The first processing unit includes a photoresist forming region, heat treatment region, and first carrying region(40,110,111). The photoresist forming region and the heat treatment region are formed at both sides of the first carrying region. The photoresist forming region includes a photoresist forming unit which forms a photoresist film on substrates. The heat treatment region includes a first heat treatment unit(CR3) for processing a thermal process. The first carrying region includes a first carrying unit for carrying the substrates. The second process unit includes first developing, second developing, and second carrying regions. The first developing and second developing regions are formed at both sides of the second carrying region. Each of the first developing and second developing regions includes a developing unit for developing the substrates. The second carrying region includes a second carrying unit(CR5) for carrying the substrates.