OBJECTIVE, IN PARTICULAR PROJECTION OBJECTIVE FOR SEMICONDUCTOR LITHOGRAPHY

An objective, in particular a projection objective in semiconductor lithography, having an optical axis (z-axis) is provided with optical elements (20) mounted in an objective housing (10). At least one optical element is mounted in an inner part connected to an outer part (21) via an intermediate part (23). Adjusting devices (26, 27) are provided in such a way as to enable relative movements between the outer part (21) and the intermediate part (23) and between the intermediate part (23) and the inner part (22), which can realize translations of the optical element in a plane perpendicular to the optical axis (z) and also parallel to the optical axis (z) and tiltings relative to the optical axis (z).