APPARATUS FOR WET ETCHING AND ETCHING METHOD USING THE SAME

A wet etching apparatus is provided to make injected etchant flow downward without staying on a substrate by transferring the substrate while the substrate is erect. A substrate transfer unit(10) transfers a substrate(S) while the substrate is erect with respect to the ground. An etchant injection u...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JUNG, KWANG BOK, CHO, TAE HEON, KO, KYOUNG WAN, LIM, JONG TAE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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