GAS INTEGRATED UINT

GAS INTEGRATED UINT

A gas integrated unit is provided to place fluid control devices on deposition blocks and to reduce a foot space of the gas integrated unit. A gas integrated unit(1) comprises first gas units(72A,72B,72C), a second gas unit(73), and deposition blocks(61A,61B,61C). The first gas units control supply...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TATSUNORI OGIHARA, TAKASHI INOUE, TAKEYA INAGAKI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A gas integrated unit is provided to place fluid control devices on deposition blocks and to reduce a foot space of the gas integrated unit. A gas integrated unit(1) comprises first gas units(72A,72B,72C), a second gas unit(73), and deposition blocks(61A,61B,61C). The first gas units control supply of a first gas. The second gas unit controls purge gas joined with the first gas units by a plurality of fluid control devices(31-34,38A-43A,38B-43B,38C-43C). The deposition blocks are placed at the first gas units. Some of the fluid control devices are placed at the deposition blocks.