METHOD FOR CLEANING A SUBSTRATE
A substrate cleaning method is provided to compose an azeotropic mixture having surface tension smaller than surface tension of deionized water and water by using an in-line static mixer installed at a dispenser. A substrate(102) is rotated. A cleaning solution is dispensed onto a surface of the rot...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A substrate cleaning method is provided to compose an azeotropic mixture having surface tension smaller than surface tension of deionized water and water by using an in-line static mixer installed at a dispenser. A substrate(102) is rotated. A cleaning solution is dispensed onto a surface of the rotating substrate. An azeotropic mixture is generated by mixing a solution having surface tension smaller than surface tension of deionized water and water. The azeotropic mixture is dispensed onto the surface of the rotating substrate. The substrate is dried by supplying inert gases onto the substrate. A melting point of the azeotropic mixture is lower than a melting point of the deionized water and the solution. The solution having the surface tension smaller than the surface tension of the water is isopropyl alcohol. |
---|