METHOD OF MANUFACTURING SUBSTRATE STRUCTURE FOR PLASMA DISPLAY PANEL
A method for manufacturing a substrate for a plasma display panel is provided to planarize a dielectric layer by removing a protrusive part from the dielectric layer. A laser beam absorbing material(17) is formed on a protrusive part(15) of a surface of a dielectric layer for covering an electrode f...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method for manufacturing a substrate for a plasma display panel is provided to planarize a dielectric layer by removing a protrusive part from the dielectric layer. A laser beam absorbing material(17) is formed on a protrusive part(15) of a surface of a dielectric layer for covering an electrode formed on a substrate(11). The laser beam absorbing material is used for absorbing easily a laser beam(14) in comparison with a material of the dielectric layer. The laser beam is irradiated on the laser beam absorbing material. The protrusive part is melted and planarized by generating heat from the laser beam absorbing material by performing the laser beam irradiation process. The dielectric layer is composed of silicon dioxide. |
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