SUBSTRATE-PROCESSING APPARATUS WITH BUFFER MECHANISM AND SUBSTRATE-TRANSFERRING APPARATUS

A substrate-processing apparatus having a buffer mechanism and a substrate-transferring apparatus are provided to exchange efficiently processed wafers and unprocessed wafers and by maintaining standby states of the processed wafers and the unprocessed wafers. An arm(3) includes a distal end. The distal end is laterally moved in a straight line direction. A plurality of end-effecters are formed to load and unload substrates in a reaction chamber(2). The end-effecters include a lower end-effecter(31) and an upper end-effecter. One end-effecter of the lower and upper end-effecters is movably coupled to the arm at the distal end of the arm. The other end-effecter of the lower and upper end-effecters is fixed to the movably coupled end-effecter. The movably coupled end-effecter includes a front surface, a rear surface, a right surface, and a left surface. The fixed end-effecter is formed with a plurality of parts which are fixed to the movably coupled end-effecter.