REAL TIME LEAK DETECTION SYSTEM OF PROCESS CHAMBER

A real-time leak detection system of a process chamber is provided to enhance productivity by reducing a time for detecting a leak in the process chamber. A spectrum sensing unit(10) monitors plasma light emission from a process chamber(2) in substrate holding/depositing/etching processes of a plasma apparatus, and senses nitrogen, oxygen, and argon spectra from the plasma light emission. A leak detection unit(20) analyzes a spectrum signal of the spectrum sensing unit and detects a leaking state of the process chamber. A main computer(30) outputs a warning signal when the leak detection unit detects the leaking state of the process chamber. The spectrum sensing unit is an optical module for capturing and analyzing the plasma light of the process chamber.