MEASURING ARRANGEMENT FOR THE OPTICAL MONITORING OF COATING PROCESSES

The invention relates to a measuring arrangement for the optical monitoring of coating processes in a vacuum chamber. According to said method, the light source is arranged inside the vacuum chamber, between the substrate holder and a diaphragm arranged beneath the substrate holder, and the light re...

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Bibliographische Detailangaben
Hauptverfasser:	HAGEDORN HARRO, KLUG WERNER, ZOELLER ALFONS
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING
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Beschreibung
Zusammenfassung:	The invention relates to a measuring arrangement for the optical monitoring of coating processes in a vacuum chamber. According to said method, the light source is arranged inside the vacuum chamber, between the substrate holder and a diaphragm arranged beneath the substrate holder, and the light receiving unit is arranged outside the vacuum chamber, in the beam path of the light source. Said substrate holder is embodied in such a way as to receive at least one substrate and can be displaced in the vacuum chamber over a coating source, preferably rotated about an axis. The substrate or substrates cross the beam path between the light source and the light receiving unit for transmission measurement purposes, and the diaphragm covers a measuring region over the coating source.