SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD THEREOF

[PROBLEMS] To provide a single-substrate cleaning apparatus which saves space and is low-cost and environment-friendly, and a cleaning method employed in such apparatus. [MEANS FOR SOLVING PROBLEMS] A substrate cleaning apparatus (1) is provided with a rotating table (50) for rotatably holding a sil...

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Bibliographische Detailangaben
Hauptverfasser:	GOTO HIDETO, SOTOAKA RYUJI, TANAKA KEIICHI, KIMURA YOSHIYA, FURUSAWA KENJI, AZUMA TOMOYUKI, JOYA SATOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	[PROBLEMS] To provide a single-substrate cleaning apparatus which saves space and is low-cost and environment-friendly, and a cleaning method employed in such apparatus. [MEANS FOR SOLVING PROBLEMS] A substrate cleaning apparatus (1) is provided with a rotating table (50) for rotatably holding a silicon substrate; a light irradiation apparatus (30) which can irradiate at least a part of the surface of the silicon substrate being held with light; a nozzle (40) which can selectively supply the substrate with at least a N2O solution and a hydrofluoric solution; and a control unit which controls supply from the light irradiation apparatus (30) and the nozzle (40) and permits the light irradiation by the light irradiation apparatus (30) when the silicon substrate is supplied with the N2O solution.