EFEM USED IN THE APPARATUS FOR MANUFACTURING SEMICONDUCTOR SUBSTRATES

An EFEM for a semiconductor substrate manufacturing apparatus is provided to define quickly an operation parameter of the semiconductor substrate manufacturing apparatus by simultaneously performing the film thickness measuring process and a surface inspection process. An EFEM(Equipment Front End Module) for a semiconductor substrate manufacturing apparatus includes a frame(120), a load port(130), and an in-line monitor(140). The frame includes a transfer robot(160). The load port and the in-line monitor are arranged at one sidewall of the frame. The in-line monitor includes an in-line thickness measuring unit and an in-line defect detector. The in-line monitor is a normal mode or an oblique mode device.