LITHOGRAPHIC APPARATUS IMMERSION DAMAGE CONTROL

An immersion damage control of a lithographic apparatus is provided to prevent crash of fluid supply system by reducing a height difference between a surface of substrate and a substrate table enclosing the substrate. A substrate(W) is held by a substrate table(WT), and a patterned radiation beam is projected onto a target portion of the substrate by a projection system(PS). A fluid supply system supplies an immersion fluid in a space between a downstream lens of the projection system and the substrate. A leakage detection system detects leakage of the immersion fluid from the fluid supply system, and has two isolated conductors positioned at a potential leakage region.