SPIN COATER HAVING WAFER MONITORING UNIT

A spin coater is provided to restrain the degradation of productivity by preventing the contamination of equipment due to the particles generated from a damaged wafer using a wafer monitoring unit. A spin coater includes a spin chuck(10) for loading and rotating a wafer(W) and a wafer monitoring uni...

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Bibliographische Detailangaben
1. Verfasser:	KIM, DONG HYEUN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A spin coater is provided to restrain the degradation of productivity by preventing the contamination of equipment due to the particles generated from a damaged wafer using a wafer monitoring unit. A spin coater includes a spin chuck(10) for loading and rotating a wafer(W) and a wafer monitoring unit. The wafer monitoring unit is used for sensing a wafer state and generating an interlock signal in case of an abnormal wafer state. The abnormal wafer state is generated due to a damaged edge portion of the wafer. The wafer monitoring unit is composed of a wafer sensor and an image information processing portion. The wafer sensor(20) is installed at the edge portion of the wafer in order to detect the wafer state at the edge portion. The image information processing portion(30) is used for generating the interlock signal according to the results of the wafer sensor.