DEVELOPING APPARATUS AND DEVELOPING METHOD

A developing apparatus and a developing method are provided to restrain the generation of developing failure and to reduce a developing time by restraining the generation of grains from a rinse solution in spite of the increase of a contact angle of a substrate. A developing apparatus includes a rot...

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Bibliographische Detailangaben
Hauptverfasser:	MITSUHASHI TSUYOSHI, SUGIMOTO KENJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A developing apparatus and a developing method are provided to restrain the generation of developing failure and to reduce a developing time by restraining the generation of grains from a rinse solution in spite of the increase of a contact angle of a substrate. A developing apparatus includes a rotation support unit(1) for rotating and supporting a substrate, a developer nozzle for supplying a developer to the substrate, a rinse nozzle for supplying a rinse solution to the substrate, an inert gas nozzle for supplying an inert gas to the substrate, and a control unit. The control unit(51) is used for controlling the rotation of the substrate and the supply of the developer, rinse solution and inert gas.