A CLEANSING LIQUID EXHAUSTING APPARATUS AND A WAFER CLEANING APPARATUS HAVING THE SAME

A CLEANSING LIQUID EXHAUSTING APPARATUS AND A WAFER CLEANING APPARATUS HAVING THE SAME

An apparatus for exhausting a cleaning solution is provided to stably perform a semiconductor fabricating process by preventing a back stream of the vapor generated from a cleaning solution used in cleaning a wafer when the wafer is dried. A cleaning solution used in cleaning a wafer is exhausted by...

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Bibliographische Detailangaben
Hauptverfasser: LEE, KANG YOUN, KIM, KYOUNG HWAN, KIM, IN GI, RYU, SOUNG KIL
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:An apparatus for exhausting a cleaning solution is provided to stably perform a semiconductor fabricating process by preventing a back stream of the vapor generated from a cleaning solution used in cleaning a wafer when the wafer is dried. A cleaning solution used in cleaning a wafer is exhausted by a first exhaust pipe(120). The cleaning solution exhausted by the first exhaust pipe is stored in a tank(140). A gas injection part injects gas toward the tank to prevent the vapor generated from the cleaning solution from flowing back along the first exhaust pipe, connected to the first exhaust pipe. The cleaning solution can be collected in a bowl(110) connected to the first exhaust pipe.