HEAT TREATMENT SYSTEM

A heat treatment system is provided to reduce a manufacturing cost and enhance spatial efficiency by heating a process gas by using a wet oxidation combustion system. A heat treatment system(1) includes a heating unit which is installed at a gas introduction path in order to heat a process gas at pr...

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Bibliographische Detailangaben
Hauptverfasser:	MIURA KAZUTOSHI, ASANO TAKANOBU, ISHII KATSUTOSHI, HOSHI GEORGE, YAMAMOTO HIROYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SEMICONDUCTOR DEVICES SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	A heat treatment system is provided to reduce a manufacturing cost and enhance spatial efficiency by heating a process gas by using a wet oxidation combustion system. A heat treatment system(1) includes a heating unit which is installed at a gas introduction path in order to heat a process gas at predetermined temperature before supplying the process gas to a reaction vessel. The gas introduction path(5) is disposed between the reaction vessel and the heating unit and includes an internal tube and an external tube. The process gas is supplied through the gas introduction path to the heating unit. The process gas is preheated at the predetermined temperature and the preheated process gas is supplied through the gas introduction path to the reaction vessel.