PLASMA FLOOD GUN OF AN ION IMPLANTER

PLASMA FLOOD GUN OF AN ION IMPLANTER

A plasma flood gun of an ion implanter is provided to prevent short circuit thereof by reducing the amount of contaminants such as introduced gas, ionized gas, and electrons to be attached on a surface of an insulating member. A filament(152) is installed at a chamber for defining a traveling path o...

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Bibliographische Detailangaben
Hauptverfasser: EARM, HYUN SUB, KANG, GON SU, KIM, YOUNG DAE, AN, SUNG YEUL, LEE, SEUNG SE
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A plasma flood gun of an ion implanter is provided to prevent short circuit thereof by reducing the amount of contaminants such as introduced gas, ionized gas, and electrons to be attached on a surface of an insulating member. A filament(152) is installed at a chamber for defining a traveling path of an ion beam in an ion implantation process. An insulating member(154) is arranged between the filament and the chamber in order to maintain an insulating state between the filament and the chamber. A fixing member(158) is extended through the filament, the insulating member, and the chamber in order to fix the filament to the chamber. A washer(156) is arranged between the insulating member and the filament. The washer includes a disk having a center hole and a cover ring for covering the insulating member.