LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING AN ELECTROSTATIC CLAMP FOR A LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING AN ELECTROSTATIC CLAMP FOR A LITHOGRAPHIC APPARATUS

A method for fabricating an electrostatic clamp is provided to supply an electrostatic clamp having reduced variation of articles, a clamp, a breakthrough or a composition thereof by including an electrostatic clamp constructed in a manner that articles are electrostatically clamped with respect to...

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Bibliographische Detailangaben
Hauptverfasser: NEERHOF HENDRIK ANTONY JOHANNES, OTTENS JOOST JEROEN, HAM ERIK LEONARDUS, MOORS JOHANNES HUBERTUS JOSEPHINA, HOPMAN JAN, VAN MIERLO HUBERT ADRIAAN, LEIJTENS JOHANNES ADRIANUS PETRUS, LE KLUSE MARCO, MEIJER HENDRICUS JOHANNES MARIA
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method for fabricating an electrostatic clamp is provided to supply an electrostatic clamp having reduced variation of articles, a clamp, a breakthrough or a composition thereof by including an electrostatic clamp constructed in a manner that articles are electrostatically clamped with respect to an article support body in a lithography apparatus. A first material layer made of a dielectric layer or a semi-dielectric layer is prepared. A mask(MA) is disposed on the surface of the first material layer, defining a shape of an electrode to be disposed in the first material layer. A recess part is etched in the first material layer, having almost the same thickness as that of the electrode to be disposed in the first material layer. The electrode is disposed in the recess part of the first material layer.