APPARATUS AND METHODS FOR SLURRY CLEANING OF ETCH CHAMBERS

APPARATUS AND METHODS FOR SLURRY CLEANING OF ETCH CHAMBERS

Described are methods of cleaning debris from semiconductor etch chambers or chamber components, one method comprising directing atomized abrasive slurry onto at least some internal surfaces of such a chamber or chamber components. Apparatus for carrying out the methods are also described.

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Hauptverfasser: LAUBE DAVID P, DAVIS IAN MARTIN
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator LAUBE DAVID P
DAVIS IAN MARTIN
description Described are methods of cleaning debris from semiconductor etch chambers or chamber components, one method comprising directing atomized abrasive slurry onto at least some internal surfaces of such a chamber or chamber components. Apparatus for carrying out the methods are also described.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title APPARATUS AND METHODS FOR SLURRY CLEANING OF ETCH CHAMBERS
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