APPARATUS FOR SUPPLYING A PHOTORESIST COMPOSITION

A photoresist solution supplier is provided to prevent the coagulation of photoresist residues by restraining the photoresist residues from being vaporized from an end portion of a nozzle using a thinner composition stored in a thinner storing unit. A photoresist solution supplier includes a nozzle...

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Bibliographische Detailangaben
Hauptverfasser:	YOON, SANG WOONG, LEE, CHANG HO, LEE, JUNG HOON, KIM, KYOUNG MI, CHOI, NAM UK
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR NOZZLES ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A photoresist solution supplier is provided to prevent the coagulation of photoresist residues by restraining the photoresist residues from being vaporized from an end portion of a nozzle using a thinner composition stored in a thinner storing unit. A photoresist solution supplier includes a nozzle for supplying a photoresist solution onto a substrate, an inner space and a heater. The inner space(122) is used for storing the nozzle. The inner space includes a thinner storing unit(150) for storing a thinner composition capable of preventing the vaporization of photoresist residues at an end portion of the nozzle. The heater(180) is used for vaporize the thinner composition.