TRANSFER CHAMBER, SUBSTRATE PROCESSING APPARATUS AND METHOD FOR SENSING TROUBLE OF A SUBSTRATE

A transfer chamber, a substrate processing apparatus, and a method of detecting a defect of a substrate are provided to optically detect a defect on a substrate by placing optical sensors near an opening through which the substrate is loaded and unloaded. A transfer chamber(20) is located in proximi...

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Bibliographische Detailangaben
Hauptverfasser: SUEKI HIDEHITO, OKABE SEIJI
Format: Patent
Sprache:eng
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