TRANSFER CHAMBER, SUBSTRATE PROCESSING APPARATUS AND METHOD FOR SENSING TROUBLE OF A SUBSTRATE

A transfer chamber, a substrate processing apparatus, and a method of detecting a defect of a substrate are provided to optically detect a defect on a substrate by placing optical sensors near an opening through which the substrate is loaded and unloaded. A transfer chamber(20) is located in proximi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SUEKI HIDEHITO, OKABE SEIJI
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	A transfer chamber, a substrate processing apparatus, and a method of detecting a defect of a substrate are provided to optically detect a defect on a substrate by placing optical sensors near an opening through which the substrate is loaded and unloaded. A transfer chamber(20) is located in proximity to a process chamber for processing a rectangular substrate(S) and includes a transfer device for transferring the substrate to the process chamber. The transfer chamber further includes an opening(22d) through which the substrate transferred by the transfer device is loaded and unloaded, and a pair of optical sensors(70) arranged near the opening at an interval narrower than the width of the substrate.