METHOD OFEDGE EXPOSURE WAFER

A method for exposing an edge of a wafer is provided to increase effective region of a wafer by detecting a reference position of the edge of the wafer to establish a boundary. An edge(A0') of a wafer is detected. The detected edge of the wafer is established as a reference position. A first ed...

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Bibliographische Detailangaben

Hauptverfasser:	OH, GYEONG HWAN, CHAE, HEE SUN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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