APPARATUS AND METHOD FOR GAINING A PATTERNED IMAGE

An apparatus and a method are provided to obtain a clear pattern image regardless of the kinds of layers and the shapes of patterns of the layers by using visible rays and infrared rays. An apparatus includes a stage(110) for supporting a wafer with a predetermined pattern, a light source unit for i...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, SANG KIL, LIM, KYU HONG, CHO, HYUNG SUK, KIM, SUNG KWEON
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An apparatus and a method are provided to obtain a clear pattern image regardless of the kinds of layers and the shapes of patterns of the layers by using visible rays and infrared rays. An apparatus includes a stage(110) for supporting a wafer with a predetermined pattern, a light source unit for irradiating visible or infrared rays onto the wafer, a driving unit for moving the stage and the light source unit, a detecting unit for detecting the rays reflected from the wafer, a transforming unit(150) for transforming the detected rays into a digital signal, and an image processing unit(160) for forming a pattern image of the wafer using the digital signal.