METHOD OF PRODUCING NANO-CVD DIAMOND MATERIALS FOR LOW SURFACE-ROUGHNESS MACHINING TOOL

A method for fabricating a nano-CVD(chemical vapor deposition) diamond material for fabricating a mirror-machining diamond tool is provided to improve reliability of lifetime of a tool as compared with natural and monocrystalline diamond used as a conventional mirror-machining tool by using an isotr...

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Bibliographische Detailangaben
Hauptverfasser:	CHAE, KI WOONG, RHYU, JEA WEON
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMISTRY CRYSTAL GROWTH METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	A method for fabricating a nano-CVD(chemical vapor deposition) diamond material for fabricating a mirror-machining diamond tool is provided to improve reliability of lifetime of a tool as compared with natural and monocrystalline diamond used as a conventional mirror-machining tool by using an isotropic physical property. The size of a diamond particle is 1 micrometer or lower with respect to the entire thickness of a CVD diamond for use in a mirror-machining tool wherein the CVD diamond has surface roughness of Ra=0.1 micrometer or lower. The diamond has a thickness not less than 30 micrometers and not more than 2 millimeters. A mirror-machined grinding material is made of metal or plastic.