SPECIMEN FOR TEM AND METHOD OF MANUFACTURING THE SAME

A specimen for TEM(Transmission Electron Microscope) and a method for manufacturing the same are provided to reduce a time for analyzing pattern wafers by analyzing simultaneously at least four or more pattern wafers. A specimen for TEM includes sectional specimens having analyzing sides which are a...

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Bibliographische Detailangaben
Hauptverfasser:	BAE, JAE SIK, KIM, GI JUNG, KANG, DAE WON, KANG, YUN DEOK, CHOI, KYOUNG JIN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A specimen for TEM(Transmission Electron Microscope) and a method for manufacturing the same are provided to reduce a time for analyzing pattern wafers by analyzing simultaneously at least four or more pattern wafers. A specimen for TEM includes sectional specimens having analyzing sides which are arranged in parallel with each other. A plurality of analyzing lines(180) have predetermined width and are extended in a parallel direction. An analyzing region(150) is extended along a predetermined direction vertical to the extending direction of the analyzing lines. A peripheral region(160) is formed around the analyzing region. Each of the analyzing lines is attached to each other so that a pair of analyzing sides are opposite to each other.