METHOD FOR DEPOSITING MATERIALS ON A SUBSTARATE

A method and apparatus for depositing a TERA film having tunable optical and etch resistant properties on a substrate using a plasma- enhanced chemical vapor deposition process, wherein for at least a part of the deposition of the TERA film, the plasma-enhanced chemical vapor deposition process employs a precursor that reduces reaction with a photoresist. The apparatus includes a chamber having an upper electrode coupled to a first RF source and a substrate holder coupled to a second RF source; and a showerhead for providing multiple process and precursor gasses.