POSITIVE RESIST COMPOSITION

Bibliographische Detailangaben

Hauptverfasser:	WOO, SEUNG WOO, PARK, JIN KYU, RYU, MI SUN, YOO, KWON YIL, JEONG, MI KYEONG, KIM, MIN JI, PARK, KYUNG JAE, CHA, HYUK JIN, KIM, JIN KON
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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