AQUEOUS RESIST STRIPPER FORMULATION
Aqueous resist stripper composition capable of stripping a resist from a resist-coated substrate such as a color filter substrate or a TFT substrate is disclosed. The aqueous resist stripper composition according to the present invention includes 0.3 to 15 % by weight of an inorganic alkaline compou...
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| creator | BYEON, WON SU KIM, WOONG LIM, CHOUL KYU JUNG, NAK CHIL JEONG, YONG MAN LEE, KWANG YONG CHA, HYUK JIN |
| description | Aqueous resist stripper composition capable of stripping a resist from a resist-coated substrate such as a color filter substrate or a TFT substrate is disclosed. The aqueous resist stripper composition according to the present invention includes 0.3 to 15 % by weight of an inorganic alkaline compound; 0.1 to 12 % by weight of a tetraalkylammonium hydroxide compound; 0.1 to 40 % by weight of a water-soluble organic solvent; and 33 to 99.5 % by weight of water, based on a total weight of the composition. The aqueous resist stripper composition according to the present invention may be useful to easily and simply remove a variety of resists which are generated during the process of manufacturing TFT-LCD but not easily removed by the con¬ ventional methods, as well as to minimize corrosions of a lower metal layer and a glass substrate during the stripping process, maximize a replacement cycle of the stripper due to its low loss by evaporation and its low aging, and regenerate the color substrate and the TFT substrate at a large scale. |
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The aqueous resist stripper composition according to the present invention includes 0.3 to 15 % by weight of an inorganic alkaline compound; 0.1 to 12 % by weight of a tetraalkylammonium hydroxide compound; 0.1 to 40 % by weight of a water-soluble organic solvent; and 33 to 99.5 % by weight of water, based on a total weight of the composition. The aqueous resist stripper composition according to the present invention may be useful to easily and simply remove a variety of resists which are generated during the process of manufacturing TFT-LCD but not easily removed by the con¬ ventional methods, as well as to minimize corrosions of a lower metal layer and a glass substrate during the stripping process, maximize a replacement cycle of the stripper due to its low loss by evaporation and its low aging, and regenerate the color substrate and the TFT substrate at a large scale.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060202&DB=EPODOC&CC=KR&NR=20060010366A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060202&DB=EPODOC&CC=KR&NR=20060010366A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BYEON, WON SU</creatorcontrib><creatorcontrib>KIM, WOONG</creatorcontrib><creatorcontrib>LIM, CHOUL KYU</creatorcontrib><creatorcontrib>JUNG, NAK CHIL</creatorcontrib><creatorcontrib>JEONG, YONG MAN</creatorcontrib><creatorcontrib>LEE, KWANG YONG</creatorcontrib><creatorcontrib>CHA, HYUK JIN</creatorcontrib><title>AQUEOUS RESIST STRIPPER FORMULATION</title><description>Aqueous resist stripper composition capable of stripping a resist from a resist-coated substrate such as a color filter substrate or a TFT substrate is disclosed. 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The aqueous resist stripper composition according to the present invention includes 0.3 to 15 % by weight of an inorganic alkaline compound; 0.1 to 12 % by weight of a tetraalkylammonium hydroxide compound; 0.1 to 40 % by weight of a water-soluble organic solvent; and 33 to 99.5 % by weight of water, based on a total weight of the composition. The aqueous resist stripper composition according to the present invention may be useful to easily and simply remove a variety of resists which are generated during the process of manufacturing TFT-LCD but not easily removed by the con¬ ventional methods, as well as to minimize corrosions of a lower metal layer and a glass substrate during the stripping process, maximize a replacement cycle of the stripper due to its low loss by evaporation and its low aging, and regenerate the color substrate and the TFT substrate at a large scale.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | AQUEOUS RESIST STRIPPER FORMULATION |
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