HIGH FREQUENCY PLASMA JET SOURCE AND METHOD FOR IRRADIATING A SURFACE

The invention relates to a high frequency plasma jet source (1) comprising a space (3) for accommodating a plasma, electrical means (8, 9) for applying a voltage to said high frequency plasma jet source (1) so as to ignite and obtain the plasma, means (4) for extracting a plasma jet (I) from the pla...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	BECKMANN RUDOLF
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	The invention relates to a high frequency plasma jet source (1) comprising a space (3) for accommodating a plasma, electrical means (8, 9) for applying a voltage to said high frequency plasma jet source (1) so as to ignite and obtain the plasma, means (4) for extracting a plasma jet (I) from the plasma space (3), and an outlet port which is separated from the vacuum chamber (7) by means of an extraction grid (4). The plasma jet (I) emerges from the high frequency plasma jet source (1) with essentially divergent radiation characteristics. The invention further relates to a method for irradiating a surface with a plasma jet (I) of a high frequency plasma jet source, said plasma jet (I) being divergent.