ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME

Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SEO, HYUN JIN, WOO, SEUNG WOO, LEE, JAE HWAN, WOO, JE SUN, CHOI, YOUNG SOO, JUNG, SANG HYUP, RYU, MI SUN, YOO, KWON YIL, CHOL, SOOK YOUNG, KIM, MIN JI, CHOI, BUM YOUNG, LEE, KEUN JOO, KIM, WOONG, JUNG, NAK CHIL, JEONG, YONG MAN, KIM, MIN SUB, PAE, YOU LEE, KIM, YOONG KEUN, CHOI, JAE LOK, HAN, CHEOL, CHA, HYUK JIN, LEE, SU HYUN
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP
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